Original equipment manufacturer of plasma etch, photoresist strip, and plasma deposition systems for the photovoltaic, optoelectronic, failure analysis, compound semiconductor, MEMS, and research markets since 1989. Trion Technology provides small-footprint, reliable, and low-cost systems customized for either laboratory or full-scale production environments.

Products we offer:

• Plasma etch systems include GaN etch, GaAs etch, SiO2 etch, and Si3N4 etch.
• Plasma deposition systems include SiO2 deposition and Si3N4 deposition.
• Photoresist Stripping Systems, Ashers, and Descum Tools.