Ariful Haque

Dr. Ariful Haque is an Assistant Professor of Electrical Engineering at the Ingram School of Engineering at Texas State University. He also holds an appointment in the Materials Science, Engineering & Commercialization program at Texas State. Prior to joining TXState, he worked as a Technology Development Mod. & Integr. Yield Engineer in the Logic Technology Development (LTD) division at Intel Corporation in the USA, where he aided in developing next-generation semiconductor process technology. Dr.Ariful Haque’s research interests are interdisciplinary and diverse. His expertise lies in the development, production, and characterization of novel functional wide bandgap semiconductor materials for electronic, photonic, and energy applications. The members of his group are actively involved in cutting-edge research focused on the development of novel processing paradigms & applications of functional thin film semiconductors and electronic devices. In the state-of-the-art lab facilities, the members of the Haque group study carbon and III-Nitride based wide bandgap thin film semiconductor fabrication, processing, characterizations, and applications. The group members also explore semiconductor doping, electrical field emission, heterostructure of carbon nanotubes and diamond, laser-solid interaction, electrical transport properties, and micro/nano-electronics.
Students and trainees who carry out their research in the Haque group learn and use a variety of techniques and approaches for research, including: pulsed laser deposition, chemical vapor deposition, DC and RF sputtering, pulsed laser annealing, Raman spectroscopy, X-ray diffraction, XPS, electron microscopy (SEM & TEM), PPMS, photodetector-solar cell simulator, I-V/C-V/Hall measurements, and other electrical measurement tools and cleanroom facilities.Dr. Haque recognizes that the STEM community can only grow by being more inclusive. Dr. Ariful Haque mentors a diverse group of students/postdocs and encourages them to not only contribute to scientific advancements but also become the next generation of leaders in science and engineering.